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(E)-1,7,7-Trimethylbicyclo[2.2.1]Heptan-2-One Oxime

nil

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(E)-Diethyl ((Benzylideneamino)Methyl)Phosphonate

nil

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(E)-Ethyl 4-Ethoxy-3-Methyl-2-Oxobut-3-Enoate

nil

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(E)-N'-(4-chlorobenzylidene)-2-(5-chloro-2-methylphenylamino)-6-(trifluoromethyl)nicotinohydrazide

On Update

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(E)-Octadec-9-enoic acid 2,6-dimethoxy-4-((5R,5aR,8aR)-6-oxo-5,5a,6,8,8a,9-hexahydro-furo[3',4':6,7]naphtho[2,3-d][1,3]dioxol-5-yl)-phenyl ester

On Update

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(E,E)-Diphenylethanedione Dioxime

nil

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(Ethylenedinitrilo)-Tetramethylenephosphonic Acid

(Ethylenedinitrilo)-tetramethylenephosphonic acid has high capacity for chelating metal ions. The complex constant with Cu is the largest in all chelating agents including EDTA. It is a kind of high-pure grade reagent and innocuous, it can be used as detergent in semiconductor chip to prepare integrated circuit, as carrying agent for radioelement in medical industry, and as agent for inspection and therapy.

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